[PDF.77dx] Chemical Mechanical Planarization of Semiconductor Materials
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Chemical Mechanical Planarization of Semiconductor Materials
From Brand: Springer
[PDF.hi96] Chemical Mechanical Planarization of Semiconductor Materials
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| #1600467 in Books | Springer | 2004-03-19 | Original language:English | PDF # 1 | 6.14 x1.06 x9.21l,1.75 | File type: PDF | 428 pages | ||0 of 0 people found the following review helpful.| Nice book|By Bing Hu|The book arrived on time. This book is new and there is no mark on this book. That's what I want. Awesome.|6 of 7 people found the following review helpful.| CMP: An Overview|By Customer|This is an outstanding book. It provides an overview of the current status of CMP and serves as a significant update t|From the Back Cover|This volume is a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, which is now a major part of state-of-the-art semiconductor technology. There are detailed discussions of all aspects of the technology, for both die
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well a...
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