[PDF.92de] Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)

Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)

[PDF.jn32] Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)

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 | #417775 in Books |  Minoru Sugawara |  1998-07-30 | Original language:English | PDF # 1 |  9.30 x1.00 x6.40l,1.50 | File type: PDF | 362 pages

 | Plasma Etching Fundamentals and Applications

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||1 of 2 people found the following review helpful.| ECR Plasma Etching|By A Customer|One of the only books available that contain theoretical and practicle information on ECR etching. A must for any etch engineers working in the semiconductor industry.|1 of 2 people found the following review helpful.| understanding plasma processes|By A Customer|Gives a detailed physical unders|About the Author|Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

You can specify the type of files you want, for your device.Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)   |  M. Sugawara. A good, fresh read, highly recommended.

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